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European Yield Forum

12 June 2007

Regensburg, Germany

Sorat Hotel

 

The Agenda

A full day of presentations and information exchange led by Rudolph applications experts and guest speakers, focusing on recent applications data from ongoing evaluations and studies at several fabs around the world.

 

0830 Coffee/Tea
0900 Yield Forum, including lunch
1600 Q&A, Discussion and Feedback
1700 Reception

 

Register now

 

Session A

Automated Macro Defect Inspection (Wafer Processing)

Session B

Automated Macro Defect Inspection (Final Manufacturing)
Session C

Process Control Metrology

 

 

Session A - Macro Defect Inspection (Wafer Processing)

  • Current data on post litho inspection
  • All surface defect detection in CMP
  • Outgoing QA, meeting zero defect requirements
  • CMP monitoring at a Taiwan foundry
  • Applying DMS for local and fabwide applications
  • The application of SPR systems to identify/solve yield
    issues (AMD)
  • Edge inspection results - SEMATECH study
  • ADC for ADI application, 10 micron resolution

 

 

Session B - Macro Defect Inspection (Final Manufacturing)

  • PMI and 2D solder bump application data
  • Eliminating manual inspection/review in the back end
  • Meeting zero defect requirements of the automotive sector
  • Preliminary data on a punch-through application
  • The latest information on thin wafer handling
  • Inspection related to known good die
  • MEMS inspection challenges and results
  • The opportunity to correlate front end and back end
    inspection data

 

 

Session C - Process Control Metrology

  • Inline memory process control with PULSE Technology
  • Measurement on mesh structures for Cu CMP at 45nm based on recent tests at a Korean fab
  • Using MetaPULSE to boost the productivity and response time of a failure analysis lab
  • Characterization of Cu Line Array Erosion with Picosecond Electronics (ST)
  • Product wafer silicide metrology at a Japanese logic company
  • Work on low-k and ultra low-k dielectric metrology for 45nm (Europe logic company)
  • Diffusion area metrology in Taiwan/China fabs; 65nm logic
    and memory
  • Advantages of angle-resolved laser scatterometry for 45nm and beyond

 

 

A detailed agenda will be sent to Forum registrants by June 4.

 

Accommodations can be reserved at the following hotels nearby the Sorat:

 

Bischofshof am Dom

 

Courtyard by Marriott

 

Hotel Orphee