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FE VII and FE VII-S Systems

The FE VII™ has a compact footprint, high throughput, and exceptional reliability to provide you with the production capabilities needed to lower your cost of ownership. Built around the Focused Beam™ laser ellipsometry technology, the FE VII measures films using multiple wavelengths and multiple angles of incidence for fast, reliable measurement of thick films while keeping the inherent accuracy when measuring thin ones. With powerful easy-to-use software and fully automated 200 mm handling solutions, the FE VII gives you the full-fab capability you want for demanding applications.

 

For more information about the FE VII or FE VII-S Systems, contact us.

Overview

  • Uses the same first-principles measuring technique employed by NIST to calibrate thickness reference standards
  • When measuring films from thin gate oxides to thick polymide, the patented multi-wavelength, multi-angle ellipsometry provides absolute order resolution
  • Excellent repeatability and matching are achieved with stable laser light sources that also prevent time consuming lamp replacement and related recalibrations
  • High-throughput, small spot, on-product measurements
  • Robust pattern recognition and dependable pattern and recipe transportability
  • Available in 200mm open cassette FE VII - or dual-SMIF configurations - FE VII-S