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S3000A System

The S3000A™ System is a production worthy, high-performance transparent metrology tool for 300mm fab-wide applications. It incorporates Rudolph's Focused Beam ellipsometry technology which was developed for demanding diffusion applications. The value-engineered S3000A is designed for transparent film applications in the litho, etch, thin films, and CMP areas.

 

The S2000 system is available for 200mm applications,

please contact us.

 

Overview

  • The S3000A provides optimized price/performance for fab-wide transparent metrology applications
  • High throughput and low price provide attractive cost of ownership for fab modules outside the diffusion area.
  • Angular resolved laser ellipsometry provides simple calibration and easy tool to tool matching
  • Focused beam ellipsometry does not require complicated dispersion models
  • Laser source high brightness and wavelength stability gives excellent repeatability
  • The ellipsometer small site option provides capability to measure 50x50 micron test sites in narrow scribe lines for advanced processes
  • Optional DUV-reflectometer provides highly repeatable measurements for 193 nm lithography processes with excellent tool-to-tool matching
  • Optional Cognex PatMAX® geometric pattern recognition software provides robust performance for wafers with extreme color variation or extremely low contrast
  • Enhanced data review mode provides improved 2D/3D mapping, data combination, measurement results review and other advanced features