Rudolph's laser spectroscopic ellipsometer systems use multiple lasers that operate simultaneously at multiple angles and wavelengths to provide powerful analysis and measurement capabilities for today's advanced processes and tomorrow's new materials. Lasers make the systems inherently stable, increasing measurement speed and accuracy while allowing for a reduction in maintenance costs. Most of Rudolph's systems also employ advanced reflectometry technology that allows the characterization of films and film stacks beyond the capabilities of conventional reflectometry or ellipsometry alone. The latest generation system, the S3000A, is designed to deliver the highest accuracy for optimizing critical film deposition processes in addition to providing superior repeatability and matching for monitoring production.

Rudolph's laser spectroscopic ellipsometers offer metrology solutions for many critical applications in semiconductor manufacturing including:

• Ultrathin Gates
• Advanced Gates
• Low-k Dielectrics
• Low-k Integration
• ARC/BARC
• SiGe
• Polysilicon
• Oxides
• Thick Films
• Etch and CMP Processes