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February 20, 2009

Whole Wafer Macro CD Metrology

Presented at SPIE Advanced Lithography, February 2009

For over ten years automated macro defect inspection systems have been utilized by lithography cells to monitor random litho track defectivity. These systems focus on throughput over sensitivity to ensure a large population of samples can be cost-effectively inspected quick enough to react to highlight track defect excursions.

Download the whtie paper (PDF)