February 20, 2009
Whole Wafer Macro CD Metrology
Presented at SPIE Advanced Lithography, February 2009
For over ten years automated macro defect inspection systems have been utilized by lithography cells to monitor random litho track defectivity. These systems focus on throughput over sensitivity to ensure a large population of samples can be cost-effectively inspected quick enough to react to highlight track defect excursions.
Download the whtie paper (PDF)