Quality control of CMOS arrays
As imaging technology has improved, the challenges related to manufacturing those devices has increased. Smaller, physical pixel size, larger array areas, better quantum efficiency all present challenges for quality control of this critical area. The ability to find sub-micron defects as well as macro-level variations within the array is important to ensure consistent response throughout the array area.
Rudolph enables inspection control for the array area with unique image processing, creative illumination and high resolution to ensure device yield.