The S2000S metrology system is a high throughput focused beam ellipsometer and reflectometer system that provides accurate thickness and refractive index measurements for a wide range of materials for semiconductor process control.
Rudolph’s S2000 Series of metrology systems delivers the same superior measurement accuracy, repeatability and tool-to-tool matching as the S3000 systems. Utilizing Rudolph’s patented focused beam laser ellipsometry (FBE) systen with optional deep ultraviolet reflectometry, visible reflectometry, the S2000 System has found widespread adoption in the specialty foundry, RF, MEMS market.
Transparent film metrology for front-end semiconductor manufacturing
Mobile communications and miniaturization has led to an explosion in the quantity and complexity of the RF devices needed in this connected world.
MEMS devices require complex and unique manufacturing processes and require a unique approach to process control.